ACT® EZStrip® 20

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ACT® EZStrip® 20 etch residue remover and positive photoresist stripper is a highly effective non hydroxylamine (HA) amine residue remover with the cleaning performance of HA containing products.

Category:
  • Al IC Cleans
Locations:
  • Global
  • US
  • Korea
  • China
  • Taiwan
  • Japan
  • Europe
Industry:
  • Semiconductors
Brands:
  • ACT®

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Product info

Description

ACT® EZStrip® 20 etch residue remover and positive photoresist stripper is a highly effective non hydroxylamine (HA) amine residue remover with the cleaning performance of HA containing products. This product can be used in aluminum applications.

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