ACT® NE-200 etch residue remover is a fluoride containing product especially formulated for removal of inorganic and highly oxidized etch residues and/or for controlled etching of contaminated oxide surfaces.
Category:
- Al IC Cleans
Locations:
- Global
- US
- Korea
- China
- Taiwan
- Japan
- Europe
Industry:
- Semiconductors
Brands:
- ACT®