Changik Lee

I'm very interesting and enjoyable when I see the possibility to apply my projects that someone's research result or goal.

Perspective

Our photo-lithography materials are customized products. It means the products need the special/unique/well-matched performances for individual customers and fast development speed. My biggest challenging is how to achieve the customer target faster than competitors, and how to keep our market share and to extend the new business.

Our company will be technology leader on the display patterning field. We will provide the best performance materials and advanced patterning solution for future display device. We will show the direction of future display devices and provide the total solution to achieve the advanced technology. Basically, I will try to develop new product and launch the product to market with my teammates. And, I would like to contribute to find out the next generation display trend and to develop the basic technology for leading future display business. 

I'm very interesting and enjoyable when I see the possibility to apply my projects that someone's research result or goal.

I joined our company through M&A, but I'm very happy that I became a member of our organization. Merck KGaA, Darmstadt, Germany has over 350 years history and one of biggest chemical company. Personally, it is my favorite part that our company has leading technology and is trying to develop the new technology to lead.

I'm very interesting and enjoyable when I see the possibility to apply my projects that someone's research result or goal.

Changik Lee

Manager photoresist development team / PM-Display solutions

Profile

Joined Merck KGaA, Darmstadt, Germany: 2004

Key research fields and topics:

  • Photo-lithography materials for flat panel display
  • DNQ based positive tone photoresist
  • Chemically Amplified Resist  

CV & Scientific activities

CV: Education

CV: Education

2002 - 2004
Master degree, Chemical engineering, Hanyang University, Korea
1995 - 2002
Bachelor, Polymer engineering / Suwon University / Korea

CV: Professional Career

CV: Professional Career

since 2018
Manager, photoresist development team, PM-Display solutions, Korea
2016 - 2018
Leader, Advanced patterning materials team, PM-D, Photoresist, Korea
2014 - 2016
Postdoc with Prof. Dr. Tomoya Ogawa at the RIKEN Institute, Wako-shi, Saitama, Japan
2013 - 2014
AZ Electronic materials US (Branchburg)
2010 - 2013
Associate Researcher, PM-D (AZ), Photoresist, Korea
2006 - 2009
Senior Researcher, AZ Electronic Materials, Photoresist, Korea
2004 - 2005
Junior Researcher, AZ Electronic Materials, Photoresist, Korea
2004 - 2005
Researcher / AZ Electronic Materials (Clarient), Photoresist, Korea

References

Patents

  • Photoresist composition and method for manufacturing a panel (Sep. 2013)
  • Photoresist composition and method of fabricating display substrate (Jan. 2015)
  • Photoresist composition and manufacturing method of thin film transistor array panel (Nov. 2015) 

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