SPIE Advanced Lithography + Patterning 2024
Meet leading researchers who are solving challenges in optical and EUV lithography, patterning technologies, metrology, and process integration for semiconductor manufacturing and adjacent applications.
Type of Event
Other
Our Participation
Sponsor
24 Feb 2024 - 29 Feb 2024
Industry Appreciation Reception
Together Advancing Sustainability (click to view our schedule)
As the Electronics business of Merck KGaA, Darmstadt, Germany, we are excited to extend our 350-year heritage to you.
Join us for an evening of stimulating conversations, traditional German delicacies, a beer garden, and the opportunity to foster valuable connections with industry peers.
Don't miss out on this special night of comradeship!
Space is limited. Register below to attend.
- Tuesday, February 27 18:00-22:00 PST | Market Street Room, Convention Center Hotel, Marriott San Jose
Registration
If you do not see the form, please click here.
Our participation
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Ralph Dammel
Technology Fellow
Keynote Presentation: Paper 12957-14 "PFAS in Semiconductor Photolithography: A Mass Balance Model" and Courses: "Introduction to Microlithography: Theory, Materials, and Processing" & "Practical Photoresist Processing"
27 Feb 2024 - FROM 10:30 TO 11:00 UTC-08:00
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Kevin Gorman
SVP Patterning Solution
Paper 12956-38 "Directed Self-Assembly: PS-b-PMMA Materials Readiness and High-chi Platforms for Extended Geometry Scaling"
29 Feb 2024 - FROM 10:40 TO 11:10 UTC-08:00
Oral Presentations
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Daniela Carja
R&D Scientist
Paper 12957-2 "Sustainable Solutions to PFAS Photoacid Generators Used in Chemically Amplified Resists"
26 Feb 2024 - FROM 13:30 TO 13:50 UTC-08:00
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Mansour Moinpour
Technical Fellow
Paper 12957-19 "The Opportunities and Challenges in Optical and Patterning Materials for Augmented Reality Displays
27 Feb 2024 - FROM 14:10 TO 14:30 UTC-08:00
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Toshiya Okamura
Paper 12957-27 "An Alternative EUV Photoresist System"
27 Feb 2024 - FROM 17:40 TO 18:00 UTC-08:00
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Takanori Kudo
Paper 12957-33 "Development of Wafer Edge Protection Layer for Advanced Patterning Process"
28 Feb 2024 - FROM 10:50 TO 11:10 UTC-08:00
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Durairaj Baskaran
Research Fellow | Co-Author
Co-Author & Presenter: Shibing Wang, Siemens EDA | Paper 12954-30 "Layout simulation for Directed Self-assembly with Chemo-epitaxy Methodology"
29 Feb 2024 - FROM 10:35 TO 10:55 UTC-08:00
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Zhong Li
Paper 12957-37 "Spin-on Metal-oxide Underlayer for EUV Patterning"
28 Feb 2024 - FROM 14:00 TO 14:20 UTC-08:00
Poster Session Reception
February 28, 17:30-19:00 | Convention Center, Hall 2
- Paper 12957-51: PFAS-free i-line strong photoacid generator for positive and negative-tone thick-film photoresists
- Presenter: Hung-Yang Chen
- Paper 12957-57: Negative tone i-line photoresist with controlled undercut profile designed for metal deposition to form metal interconnects
- Presenter: Anupama Mukherjee
SPIE Activities
Courses by Ralph Dammel:
- Introduction to Microlithography: Theory, Materials, & Processing February 25, 8:30-17:30 PST | Instructors: Ralph Dammel, Research Fellow, EMD Electronics, and Murrae J. Bowden, EMP Consultants
- Practical Photoresist Processing February 29, 8:30-12:30 PST | Instructor: Ralph Dammel, Research Fellow, EMD Electronics
SPIE Student-Mentor Luncheon: February 26, 11:45-12:45 PST | Convention Center, Room 211A
Network with the panelists and join the advanced lithography community to discuss current projects, next career steps, and more.
SPIE Welcome Reception: February 26, 18:00-19:00 PST | Convention Center, Grand Ballroom Concourse
Join us to enjoy drinks and hors-d'oeuvres on the first night of the conference. All attendees are welcome. Please remember to wear your registration badge. Dress is casual.
SPIE Women's Networking Lunch: February 27 12:00-13:00 PST | Convention Center, Room 212B
Join other women in the field for informal discussions and networking.
Contact us
- Interested in working together or need support finding the right materials solution? Click here to connect at the show!
- Curious about how it is to work with us as an employee? Chat with one of our colleagues directly using our interactive Q&A tool.
Materials Matter
Semiconductor companies large and small talk about achieving climate neutrality by 2030. That sounds like a great goal. But merely achieving that goal won’t solve the emissions problem. How we get there matters.
Interesting in our webinar?
Watch our on-demand webinar to discover how Directed Self-Assembly (DSA) technology and its material development can help overcome the scaling barriers of EUV lithography. By clicking this button, you're leaving our website to SEMI.
How can you spell semiconductors without “F”(luorine)?
PFAS is prevalent in our world and very much in our current conversation. But what is it? (or more correctly, what are they?), why are they under great scrutiny? are they all hazardous? and how would the semiconductor industry be impacted by their removal? Click here and find out.
Discover Future talk
Can you imagine microchips that can assemble themselves at the molecular level?! Tune in as our experts, Dr. Baskaran Durairaj and Dr. Jerome Wandell, explore the many benefits of Directed Self-Assembly (DSA) technology. Click and listen Microchips, Inspired by Nature!