Advancing Semicon­ductors

...and accelerating the next generation of deposition materials! Welcome to the ALD 2020 conference page of EMD Performance Materials. It was a pleasure to e-meet you!

Booth Design ALD 2019

ALD/ALE 2020

Welcome to the Digital World!

We participated in the 20th International Conference on Atomic Layer Deposition - this year in a virtual format.

Below you find the recordings of our virtual Panel Discussion as well as the virtual Poster Sessions and Presentations – Don’t miss it!  

Our virtual program

Watch the record of our Virtual Panel Discussion here and learn about challenges and opportunities in ALD & ALE as well as market trends and recent acquisitions!

 

This was our program - thanks for participating!

Monday, June 29

1:00pm - 2:00pm Virtual Panel Discussion: Join our experts and learn about challenges and opportunities in ALD & ALE as well as market trends and recent acquisitions - watch the recording here

5:45pm – 7:00pm Poster Session: Atomic Layer Deposition of Niobium Nitride Thin Film with NbCl5 and NH3 – Dr. Moo-Sung Kim, Versum Materials Korea – Poster Code: AF-MoP20
Download presentation here
Watch the recording here (for AVS Members only)

 

Tuesday, June 30

1:45pm – 2:00pm Oral Session: Deposition of Inherently Ferroelectric Films by ALD Using ZrD-04 and HfD-04 – Dr. Vijay K. Narasimhan, Intermolecular – Presentation Code: AA-WeA04
Download presentation here
Watch the recording here (for AVS Members only)

5:30pm – 7:00pm Poster Session: Area Selective Atomic Layer Deposition of Molybdenum Films on Nanoscale Metal and Metal Nitride Patterns – Se-Won Lee, Versum Materials Korea, Poster Code: AS-TuP13
Download presentation here
Watch the recording here (for AVS Members only)

5:30pm – 7:00pm Poster Session: Mechanism of Leakage Variation with Aspect Ratio in ALD High-k ZrO2 and HZO Dielectrics - Martin McBriarty, Intermolecular Inc, Poster Code: AA-TuP70
Download presentation here
Watch the recording here (for AVS Members only)

 

Wednesday, July 1

11:45am – 12:00pm Oral Session: Super-Conformal ALD of Metallic Mo Films by Simultaneous Deposition and Etch – Jean-Sebastien Lehn, EMD Performance Materials – Presentation Code: LI3-WeM14
Download presentation here
Watch the recording here (for AVS Members only)

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Who we are

Merck KGaA, Darmstadt, Germany, a leading science and technology company, operates across healthcare, life science and performance materials.

With the acquisition of Versum Materials and Intermolecular Inc., our comprehensive Semiconductor Solutions business unit enables the semiconductor industry to develop electronic devices that are smaller, faster, more powerful, and on the cutting edge of innovation. 

In the area of deposition, we deliver advanced chemistries and process technologies in precursor materials. From laboratory scale molecular design to high volume manufacturing, our rich portfolio of high purity metal and dielectric precursor materials empower both FEOL and BEOL applications. Additionally, we offer inorganic spin-on dielectric materials designed for gap-filling and planarization for FEOL applications.

At the heart of our business lies deep collaborative relationships, along with our unique ability to develop tailored chemistries. Our intimate understanding of the semiconductor market and our customer needs, coupled with our 30+ years of experience, will help you be successful in your deposition processes.

Meet us virtually and discover next generation high tech materials and specialty chemicals for your demanding applications.

Any inquiries?

We are happy to answer your questions as soon as possible!

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