Deposition Materials

Our deposition materials are chemistries enabling thin film Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD) of metals/oxides/nitrides for next generation advanced logic and memory devices.


Precursors for CVD and ALD application

We deliver advanced chemistry and process technology in precursor materials for the semiconductor industry. From laboratory scale molecular design in R&D to high volume scale up, our rich portfolio of high purity metal and dielectric precursor materials empower FEOL and BEOL applications. At the heart of our business, deep collaborative relationships, along with our unique ability to develop tailored chemistries for deposition processes, are guided by an intimate understanding of customer needs. Our development cycle has key research gates which review molecular design, synthesis development, performance criteria, process development and path forward for commercial high volume production. 

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