Precursors for CVD and ALD application
We deliver advanced chemistry and process technology in precursor materials for the semiconductor industry.
From laboratory scale molecular design in R&D to high volume scale up, our rich portfolio of high purity metal and dielectric precursor materials empower FEOL and BEOL applications.
At the heart of our business are deep collaborative relationships and an intimate understanding of customer needs. This leads to our unique ability to develop tailored chemistries for deposition processes. Our development cycle has key research gates:
- Molecular design
- Synthesis development
- Performance criteria
- Process development
- Path forward for commercial high volume production
Join us at ALD 2019!
We exhibit at the 19th International Conference on Atomic Layer Deposition. The event is dedicated to the science of atomic layer controlled deposition of thin films and topics related to atomic layer etching.Visit our event page