Deposition Materials

Our deposition materials are chemistries enabling thin film Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD) of metals, oxides an nitrides for next gen advanced logic and memory devices.


Precursors for CVD and ALD application

We deliver advanced chemistry and process technology in precursor materials for the semiconductor industry.

From laboratory scale molecular design in R&D to high volume scale up, our rich portfolio of high purity metal and dielectric precursor materials empower FEOL (= Front end of line) and BEOL (= Back end of line) applications.

At the heart of our business are deep collaborative relationships and an intimate understanding of customer needs. This leads to our unique ability to develop tailored chemistries for deposition processes. Our development cycle has key research gates:

  • Molecular design
  • Synthesis development
  • Performance criteria
  • Process development
  • Path forward for commercial high volume production 

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