Patterning Lithography
Patterning and Lithography are pivotal processes in semiconductor manufacturing, driving the innovation behind today’s advanced electronic devices.
cutting-edge expertise
We are a critical partner in patterning transfer technology. From developing the first-ever photoresist materials to today’s leading patterning technologies, we continue to innovate solutions to support what customers need.
Patterning and lithography work together to create intricate designs on semiconductor wafers, utilizing light to transfer precise patterns from a photomask onto a photosensitive material called photoresist. Patterning is essential for forming the complex circuits found in microprocessors, memory, and logic chips. As feature sizes shrink to nanometer scales, lithography techniques, such as extreme ultraviolet (EUV) lithography, are evolving to meet the demands of miniaturization.
Photoresists
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g-line/i-line photoresist
We offer BB\X-over, g-line/i-line photoresists for front-end submicron lithography processes.Dive deeper -
KrF Thick film resists
KrF thick film resists perform high sensitivity and high resolution with excellent pattern profile.Dive deeper -
Lift off resists
AZ® nLOF™ and pLOF™ are i-line photoresist series that simplify complex image reversal and multilayer lift-off litho processes.Dive deeper -
Thick film resists
TFR enables manufacturing of patterned conductive circuitry.Dive deeper
Patterning Enhancement Materials
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TARC
Top Antireflective Coating (TARC) is a cost-effective solution for reflectivity control.Dive deeper -
BARC
Bottom Antireflective Coating (BARC) provides a comprehensive solution for reflectivity control.Dive deeper -
Shrink
Chemical shrink is a post-resist-patterning process that can shrink trench or contact hole patterns.Dive deeper -
ArF Rinse
Industry standard brought through our collaboration with TEL.Dive deeper -
SoC
Spin-on carbon materials provide high transparency for improved overlay control, high throughput & high thermal stability.Dive deeper
Next-gen Lithography Materials
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DSA
Directed Self-assembly (DSA) is a complimentary patterning technique that improves the CD variance of an existing pattern.Dive deeper -
EUV Rinse
A product applied to EUV process brought through our collaboration with TEL.Dive deeper -
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What we offer
We are pioneers in photoresist materials since their inception and now a partner for high-resolution patterning, pattern defect control, and high-quality transfer technology. We are focused on achieving higher resolution and precision to support the miniaturization of semiconductor devices.
Our Lithography Portfolio
Our comprehensive and customized portfolio of lithography solutions for pattern transfer technology empower our customers to accomplish objectives with greater precision, speed, and efficiency.
Our expertise includes pattern enhancement, developers, and support for conventional, EUV, and advanced lithography techniques. We offer broad application support in various areas, including Lithography, Advanced Patterning, Litho Process Enhancement and Multi-Layer Etch Stacks.
Capabilities
We are an innovative partner for high-resolution patterning, pattern defect control, and high-quality transfer technology. Our lithography solutions are tailored to fit the unique requirements of the evolving wafer level packaging market.
- Our comprehensive and customized solutions encourage precise, efficient, and expedient high-quality pattern transfer technology
- We leverage our proven track record with roots tracing back to the development of the very first photoresist materials to provide trusted, performance-tested products and solutions.
- Our global presence with localized manufacturing for EUV and complementary Directed Self Assembly (DSA) technologies have expanded and evolved, along with our techniques to meet the demands of miniaturization.
Innovations For Tomorrow
Our exceptional R&D capabilities drive constant innovation towards advanced patterning solutions for next generation devices, including revolutionary patterning materials like DSA and high-performance photoresist for specialty applications.
Utilizing Materials Intelligence™ platform, we drive innovation towards sustainable solutions, focused on PFAS-free replacement programs. We employ advanced digital modeling for new formulations that quickly optimize solutions. Together with our customers, we drive the future of electronics with greater precision and sustainability.
We pair our Materials Intelligence™ platform with advanced patterning solutions to provide high-resolution patterning and pattern defect control to support next generation devices. Our formulas serve the entire commercialization process from innovation, development and integration.
Contact Us
Interested in working together? Get in touch to learn more.
Patterining Manufacturing and R&D Facilities
Our global reach, combined with localized supply chain expansion, ensures a reliable and timely supply of products, enhancing our customers' operational resilience and productivity.