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SPIE Advanced Lithography + Patterning 2026
Join leading researchers who are solving challenges in optical and EUV lithography, patterning technologies, metrology, and process integration for semiconductor manufacturing and adjacent applications.
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Type of Event
Other
Celebrating 50 Years
A milestone marking 5 decades of innovation in semiconductor manufacturing, microlithography, and patterning technologies.
Industry Appreciation Reception
Join us for an evening of meaningful dialogue, artisanal hors d'oeuvres as we explore how we can shape the next 50 years of patterning innovation together.
Space is limited. Register by February 20.
Registration
If you do not see the form, please click here.
Sustainable Patterning Solutions
Across the Lithography Spectrum: PFAS-free materials for EUV, advanced nodes, and advanced packaging—delivering sustainable, cutting-edge performance.
Our Thought Leadership
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Yuki Kubo
Senior Scientist
Inkjet-based adaptive planarization material development
24 Feb 2026 - FROM 14:20 TO 15:00 UTC-08:00
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Toshiya Okamura
R&D Manager
Negative-tone EUV Photoresist System for Bridge Technology Between Positive CAR and MOR
24 Feb 2026 - FROM 15:30 TO 15:50 UTC-08:00
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Ralph Dammel
Technology Fellow
Estimation of Resist Roughness for Blue-X Wavelengths
24 Feb 2026 - FROM 18:10 TO 18:30 UTC-08:00
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Ionela-Daniela Carja
R&D Scientist
Continuing The Journey: Advancements in The Development of Fluorine-free Photo-acid Generators for Semiconductor Lithography
25 Feb 2026 - FROM 10:50 TO 11:10 UTC-08:00
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Takashi Sekito
R&D Manager
Inkjet-based adaptive planarization material development
25 Feb 2026 - FROM 14:20 TO 14:40 UTC-08:00
Poster Session Reception
February 25, 17:30-19:00 | Convention Center, Hall 2
- Takumi Nakazato "PFAS Free PAG Development for Chemically Amplified Photoresist"
- Hung-Yang Chen "Fluorine-free and PEB-less i-line Chemically Amplified Resist for Panel Level Packaging (PLP)"
SPIE Activities
- Introduction to Microlithography: Theory, Materials, and Processing February 22, 8:30 to 17:30 PST
- Practical Photoresist Processing February 26, 8:30 to 12:30 PST
SPIE Student-Mentor Luncheon February 24, 12:00-13:30 PST | Convention Center, Room 212B
- Network with the panelists and join the advanced lithography community to discuss current projects, next career steps, and more.
SPIE Welcome Reception - EMD Electronics Sponsored Event February 24, 19:00-20:00 PST | Convention Center, Grand Ballroom Foyer
- Join us to enjoy drinks and hors-d'oeuvres on the first night of the conference. All attendees are welcome. Please remember to wear your registration badge. Dress is casual.
Contact us
- Interested in working together or need support finding the right materials solution? Click here to connect at the show!
- Curious about how it is to work with us as an employee? Chat with one of our colleagues directly using our interactive Q&A tool.
Materials Matter
Semiconductor companies large and small talk about achieving climate neutrality by 2030. That sounds like a great goal. But merely achieving that goal won’t solve the emissions problem. How we get there matters.
Interesting in our webinar?
Watch our on-demand webinar to discover how Directed Self-Assembly (DSA) technology and its material development can help overcome the scaling barriers of EUV lithography. By clicking this button, you're leaving our website to SEMI.