SPIE Advanced Lithography + Patterning 2026

Join leading researchers who are solving challenges in optical and EUV lithography, patterning technologies, metrology, and process integration for semiconductor manufacturing and adjacent applications.

Type of Event

Other

22 Feb 2026 - 26 Feb 2026

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Event Website

San Jose, California United States of America

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Celebrating 50 Years

A milestone marking 5 decades of innovation in semiconductor manufacturing, microlithography, and patterning technologies. 

advancing sustainability advancing sustainability

Sustainable Patterning Solutions

Across the Lithography Spectrum: PFAS-free materials for EUV, advanced nodes, and advanced packaging—delivering sustainable, cutting-edge performance.

Industry Appreciation Reception

Join us for an unforgettable evening of engaging conversations, delectable hors d'oeuvres, and fine refreshments.

Don't miss this opportunity to connect with industry peers, expand your network, and enjoy a delightful experience! 

Space is limited. Register below to attend. 

  • Tuesday, February 24  18:30-21:00 PST | Market Street, Marriott San Jose  

Registration

If you do not see the form, please click here.

Oral Presentations

  1. Yuki Kubo

    Yuki Kubo

    Senior scientist

    Inkjet-based adaptive planarization material development

    24 Feb 2026 - FROM 14:20 TO 15:00 UTC-08:00

  3. Toshiya Okamura

    Toshiya Okamura

    R&D Manager

    Negative-tone EUV Photoresist System for Bridge Technology Between Positive CAR and MOR

    24 Feb 2026 - FROM 15:30 TO 15:50 UTC-08:00

  5. Ralph Dammel

    Ralph Dammel

    Technology Fellow

    Estimation of Resist Roughness for Blue-X Wavelengths

    24 Feb 2026 - FROM 18:10 TO 18:30 UTC-08:00

  7. Ionela-Daniela Carja

    Ionela-Daniela Carja

    R&D Scientist

    Continuing The Journey: Advancements in The Development of Fluorine-free Photo-acid Generators for Semiconductor Lithography

    25 Feb 2026 - FROM 10:50 TO 11:10 UTC-08:00

  9. Takashi Sekito

    Takashi Sekito

    R&D Manager

    Inkjet-based adaptive planarization material development

    25 Feb 2026 - FROM 14:20 TO 14:40 UTC-08:00

February 25, 17:30-19:00 PST

Poster Session Reception

February 25, 17:30-19:00 | Convention Center, Hall 2

  • Takumi Nakazato "PFAS Free PAG Development for Chemically Amplified Photoresist"
  • Hung-Yang Chen "Fluorine-free and PEB-less i-line Chemically Amplified Resist for Panel Level Packaging (PLP)" 
February 22-26

SPIE Activities

Courses by Ralph Dammel
 
  • Introduction to Microlithography: Theory, Materials, and Processing February 22, 8:30 to 17:30 PST
  • Practical Photoresist Processing February 26, 8:30 to 12:30 PST

SPIE Student-Mentor Luncheon February 24, 12:00-13:30 PST | Convention Center, Room 212B

  • Network with the panelists and join the advanced lithography community to discuss current projects, next career steps, and more.

SPIE Welcome Reception - EMD Electronics Sponsored Event February 24, 19:00-20:00 PST | Convention Center, Grand Ballroom Foyer

  • Join us to enjoy drinks and hors-d'oeuvres on the first night of the conference. All attendees are welcome. Please remember to wear your registration badge. Dress is casual.

Contact us

  • Interested in working together or need support finding the right materials solution? Click here to connect at the show!
  • Curious about how it is to work with us as an employee? Chat with one of our colleagues directly using our interactive Q&A tool.

 

EMD Electronics semiconductor materials sustainability white paper
Investing in a Sustainable Semiconductor Future

Materials Matter

Semiconductor companies large and small talk about achieving climate neutrality by 2030. That sounds like a great goal. But merely achieving that goal won’t solve the emissions problem. How we get there matters.

Learn more

Interesting in our webinar?

Watch our on-demand webinar to discover how Directed Self-Assembly (DSA) technology and its material development can help overcome the scaling barriers of EUV lithography. By clicking this button, you're leaving our website to SEMI.