ACT® 930 etch residue remover and positive photoresist is a low hydroxylamine (HA) based product for aluminum applications.
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ACT® 930 etch residue remover and positive photoresist is a low hydroxylamine (HA) based product for aluminum applications.
ACT® 930 etch residue remover and positive photoresist is a low hydroxylamine (HA) based product for aluminum applications. It is low cost and extremely effective in removing etch residue. It is well adopted in the worldwide semiconductor industry.
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