BTBAS

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BTBAS Bis(tertiary-butylamino)silane EXTREMA® is a precursor for depositing silicon nitride and silicon oxide films at lower temperatures.

Category:
  • Deposition
  • Spacer Patterning
  • Spacer Patterning
  • Dielectrics
Locations:
  • Global
  • US
  • Korea
  • China
  • Taiwan
  • Japan
  • Europe
Industry:
  • Semiconductors
  • Logic
  • Memory (DRAM, NAND, 3D NAND)
  • Sensors (MEMS, Optoelectronics)
  • Advanced Packaging

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