BTBAS

Print

BTBAS Bis(tertiary-butylamino)silane EXTREMA® is a precursor for depositing silicon nitride and silicon oxide films at lower temperatures.

Category:
  • Deposition
  • Spacer Patterning
  • Spacer Patterning
  • Dielectrics
Locations:
  • US
  • Korea
  • China
  • Taiwan
  • Japan
  • Europe
Industry:
  • Semiconductors
  • Logic
  • Memory (DRAM, NAND, 3D NAND)
  • Sensors (MEMS, Optoelectronics)
  • Advanced Packaging

By {{ authorText(item) }}

{{ item.publicationDate }}

Find the right material

Identifying the right product can be overwhelming. Our experts can help you find the most suitable solution for your needs.

Contact us