Germane Hydrogen Mixture 10% ±0.2% Mixture is used in semiconductor thin film deposition applications.
- Deposition
- Semiconductor Materials
- US
- Korea
- China
- Taiwan
- Japan
- Europe
- Logic
- Memory (DRAM, NAND, 3D NAND)
Germane Hydrogen Mixture 10% ±0.2% Mixture is used in semiconductor thin film deposition applications.
Germane Hydrogen Mixture 10% ±0.2% Mixture is used in semiconductor thin film deposition applications.
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