GeH4 ─ Germane Hydrogen Mixture 10%

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Germane Hydrogen Mixture 10% ±0.2% Mixture is used in semiconductor thin film deposition applications.

Category:
  • Deposition
  • Semiconductor Materials
Locations:
  • Global
  • US
  • Korea
  • China
  • Taiwan
  • Japan
  • Europe
Industry:
  • Logic
  • Memory (DRAM, NAND, 3D NAND)

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Description

Germane Hydrogen Mixture 10% ±0.2% Mixture is used in semiconductor thin film deposition applications.

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