TDMAT is a liquid chemical source suitable for the chemical vapor deposition of titanium nitride films. TiN films are effective diffusion barriers for IC applications.
Category:
- Metal Nitrides
- Metal Hardmasks
- Hardmasks
- Deposition - Metal Hardmask
Locations:
- US
- Korea
- China
- Taiwan
- Japan
- Europe
Industry:
- Semiconductors
- Logic
- Memory (DRAM, NAND, 3D NAND)
- Display
- Non-semiconductor