Triethylborate (TEB) is a liquid boron source used for Borosilicate (BSG) and Borophosphosilicate (BPSG) glass Thin Film Deposition in low pressure, atmospheric pressure and plasma enhanced CVD systems.
Category:
- Deposition
- Doping
- Metals
- Boron Dopants
Locations:
- US
- Korea
- China
- Taiwan
- Japan
- Europe
Industry:
- Semiconductors
- Logic
- Memory (DRAM, NAND, 3D NAND)