TEB

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Triethylborate (TEB) is a liquid boron source used for Borosilicate (BSG) and Borophosphosilicate (BPSG) glass Thin Film Deposition in low pressure, atmospheric pressure and plasma enhanced CVD systems.

Category:
  • Deposition
  • Doping
  • Metals
  • Boron Dopants
Locations:
  • Global
  • US
  • Korea
  • China
  • Taiwan
  • Japan
  • Europe
Industry:
  • Semiconductors
  • Logic
  • Memory (DRAM, NAND, 3D NAND)

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