TEOS

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Tetraethyl Orthosilicate (TEOS) is used as a semiconductor silicon source for the Thin Film Deposition of doped and undoped silicon dioxide films.

Category:
  • Dielectrics
Locations:
  • US
  • Korea
  • China
  • Taiwan
  • Japan
  • Europe
Industry:
  • Semiconductors
  • Logic
  • Memory (DRAM, NAND, 3D NAND)
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Description

Tetraethyl Orthosilicate (TEOS) is used as a semiconductor silicon source for the Thin Film Deposition of doped and undoped silicon dioxide films. It is used as a replacement for silane and other pyrophoric silicon sources.

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