Used mostly for silicon epi applications in semi fab and semi wafer production. Used with HCl for depositing Epitaxial film on wafers.
- Deposition
- Global
- US
- Korea
- China
- Taiwan
- Japan
- Europe
- Semiconductors
Used mostly for silicon epi applications in semi fab and semi wafer production. Used with HCl for depositing Epitaxial film on wafers.
Used mostly for silicon epi applications in semi fab and semi wafer production. Used with HCl for depositing Epitaxial film on wafers.
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