SiHCl3 ─ Trichlorosilane

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Used mostly for silicon epi applications in semi fab and semi wafer production. Used with HCl for depositing Epitaxial film on wafers.

Category:
  • Deposition
Locations:
  • Global
  • US
  • Korea
  • China
  • Taiwan
  • Japan
  • Europe
Industry:
  • Semiconductors

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Description

Used mostly for silicon epi applications in semi fab and semi wafer production. Used with HCl for depositing Epitaxial film on wafers.

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