Triethylborate (TEB) is a liquid boron source used for Borosilicate (BSG) and Borophosphosilicate (BPSG) glass Thin Film Deposition in low pressure, atmospheric pressure and plasma enhanced CVD systems.
Category:
- Doping
- Deposition
Locations:
- US
- Korea
- China
- Taiwan
- Japan
- Europe
Industry:
- Semiconductors