Triethylborate

Print

Triethylborate (TEB) is a liquid boron source used for Borosilicate (BSG) and Borophosphosilicate (BPSG) glass Thin Film Deposition in low pressure, atmospheric pressure and plasma enhanced CVD systems.

Category:
  • Doping
  • Deposition
Locations:
  • US
  • Korea
  • China
  • Taiwan
  • Japan
  • Europe
Industry:
  • Semiconductors

By {{ authorText(item) }}

{{ item.publicationDate }}

Product info

Description

Triethylborate (TEB) is a liquid boron source used for Borosilicate (BSG) and Borophosphosilicate (BPSG) glass Thin Film Deposition in low pressure, atmospheric pressure and plasma enhanced CVD systems.

Find the right material

Identifying the right product can be overwhelming. Our experts can help you find the most suitable solution for your needs.