SEMI Industry Strategy Symposium (ISS) 2026

Sustainability in chip manufacturing is more critical than ever, with greenhouse gas (GHG) emissions and PFAS alternatives at the forefront of our efforts. In this talk, Kevin Gorman, SVP and Head of Patterning Solutions, will showcase innovative strides in tackling these pressing challenges within the semiconductor industry.

In this session, we will review progress in the development of PFAS-free alternatives across various applications, including fluorinated surfactants, EUV rinses to prevent pattern collapse, photoacid generators (PAGs) for chemically amplified photoresists, and top anti-reflective coatings. Additionally, we will present advancements in alternative etch gases that significantly reduce atmospheric lifetime, offering promising replacements for traditional etch gases and contributing to lower GHG emissions in chip manufacturing.