ACT® NE-89

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ACT® NE-89 etch residue remover is a fluoride containing chemistry specifically formulated for use in etch residue removal and/or controlled etching of contaminated oxide surfaces.

Category:
  • Al IC Cleans
Locations:
  • Global
  • US
  • Korea
  • China
  • Taiwan
  • Japan
  • Europe
Industry:
  • Semiconductors
Brands:
  • ACT®

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Product info

Description

ACT® NE-89 etch residue remover is a fluoride containing chemistry specifically formulated for use in etch residue removal and/or controlled etching of contaminated oxide surfaces. This product was designed specifically for single wafer tool processing.

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