Alpha-terpinene (ATRP) Precursor is used as a sacrificial organic precursor for the chemical vapor deposition of high quality low constant films.
- Low-k Dielectrics
- US
- Korea
- China
- Taiwan
- Japan
- Europe
- Semiconductors
- Logic
- Memory (DRAM, NAND, 3D NAND)
Alpha-terpinene (ATRP) Precursor is used as a sacrificial organic precursor for the chemical vapor deposition of high quality low constant films.
Alpha-terpinene (ATRP) Precursor is used as a sacrificial organic precursor for the chemical vapor deposition of high quality low constant films. When used in the PDEMS® ILD process, it can be used to deposit ultra-low k films with k -2.5 and below.
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