MoO2Cl2 ─ Molybdenum Dichloride Dioxide

We offer several Mo precursors, including molybdenum dichloride dioxide (MoO2Cl2), a specialized precursor used in chemical vapor deposition (CVD) and Atomic Layer Deposition (ALD) processes. This compound offers unique benefits, such as:       

• High Purity and Quality: Our ultra-low moisture MoO2Cl2 is produced to the highest quality and purity standards, meeting the stringent requirements of advanced semiconductor manufacturing.    
• Enhanced Performance: The use of MoO2Cl2 allows for the deposition of thin films of Molybdenum that improve conductivity, leading to enhanced performance of semiconductor devices. 
• Tailored Solutions: We provide integrated solutions that combine our high-quality MoO2Cl2 with advanced delivery systems, such as our Chemguard® Vapor 200. Designed from the outset to be high-volume manufacturng (HVM) ready, our integrated delivery systems including Chemguard® Vapor 200 ensure maximum uptime and reliability, facilitating seamless integration into high-volume production environments and enhancing overall manufacturing efficiency.
  

Our integrated delivery systems, along with our best-in-class high density container fill enhance the handling and application of MoO2Cl2 in the manufacturing process, ensuring uninterrupted production and optimal material utilization. Maintaining a constant temperature throughout the transport of the precursor is essential to prevent production downtime, further emphasizing the reliability of our systems.