TEMAHf

Print

Tetrakis(ethylmethylamido)hafnium(TEMAHf) is a liquid source material for ALD of the high-k gate rielectric such as HfO2 and HfxNy.

Category:
  • Metal Nitrides
  • Metal Hardmasks
  • Deposition - Metal Hardmask
Locations:
  • Global
  • US
  • Korea
  • China
  • Taiwan
  • Japan
  • Europe
Industry:
  • Semiconductors
  • Logic
  • Memory (DRAM, NAND, 3D NAND)

By {{ authorText(item) }}

{{ item.publicationDate }}

Find the right material

Identifying the right product can be overwhelming. Our experts can help you find the most suitable solution for your needs.

Contact us