Tungsten CMP slurries

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Our Tungsten CMP products are tunable Slurries designed to meet performance requirements for removal rate, topography and defectivity.

Category:
  • MOL MG & Contacts
Locations:
  • Global
  • US
  • Korea
  • China
  • Taiwan
  • Japan
  • Europe
Industry:
  • Logic
  • Memory (DRAM, NAND, 3D NAND)
  • Sensors (MEMS, Optoelectronics)
  • Advanced Packaging

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Product info

Description

Our Tungsten CMP products are tunable Slurries designed to meet performance requirements for removal rate, topography and defectivity. This product family offers a wide variety of solutions, including highly selective, low selective and buff Tungsten slurries. They are designed by utilizing our advanced abrasive and chemical additive formulation technology. Key performance differentiations consist of optimal removal rates, wide selectivity windows and tunable dilution at point of use, all optimized for cost of ownership advantage.

MOL MG and Contacts CMP
Tungsten CMP Slurries

MOL MG and Contacts CMP

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