WCl5 is used for CVD or ALD fluorine-free Tungsten liner and fill depositions for metal gate contact in logic devices.
- High-k
- Metal Oxides
- Global
- US
- Korea
- China
- Taiwan
- Japan
- Europe
- Semiconductors
- Logic
- Memory (DRAM, NAND, 3D NAND)
WCl5 is used for CVD or ALD fluorine-free Tungsten liner and fill depositions for metal gate contact in logic devices.
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