AVS International Conference on Atomic Layer Deposition (ALD/ALE) 2025

This event is organized by the Association for Science and Technology Materials, Interfaces and Processing (AVS).

Type of Event

Other

Our Participation

Sponsor

22 Jun 2025 - 25 Jun 2025

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Event Website

JeJu Convention Centre, Main Hall

Jeju, South Korea

Elevate your Innovations with our Vast Portfolio

Join us at the AVS ALD/ALE conference, focused on atomic layer controlled deposition of thin films and atomic layer etching. Elevate your innovations with our vast portfolio!

Connect with us

  • AVS ALD Welcome Reception – Sponsored by Merck KGaA, Darmstadt, Germany
  • Sunday, June 22nd from 18:00 to 20:00 @JeJu Convention Centre, Main Hall

Join us for drinks and stimulating conversations. All conference delegates are welcome to attend. Take the opportunity to get exclusive expert advice on-site.

Click here to connect at the event!

SEMICONDUCTOR SOLUTIONS information kit

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Advance Your Knowledge With Our Leading Engineers

  1. Haripin Chandra

    Haripin Chandra

    Senior R&D Manager

    Moderator: ALD Fundamentals Session AF2-MoA Precursor Chemistry

    23 Jun 2025 - FROM 13:30 TO 15:00 UTC+09:00

  3. Rick Chen

    Rick Chen

    Global Head of Integrated Customer Applications

    Moderator: Area Selective ALD Session AS2-WeM Area Selective Deposition III

    24 Jun 2025 - FROM 10:45 TO 11:45 UTC+09:00

Poster Session AF-MoP ALD Fundamentals

  1. Dahyun Lee

    Dahyun Lee

    Research Scientist

    Paper: AF-MoP-3 "Characterization of Novel Precursors for Improved ALD Performance in HfO2 Films"

    23 Jun 2025 - FROM 17:45 TO 19:00 UTC+09:00

  3. Randall Higuchi

    Randall Higuchi

    Scientific Associate Director

    Paper: AF-MoP-8 "Novel Indium Precursor with Improved Physical Properties and ALD Window for Atomic Layer Deposition of Indium Oxide"

    23 Jun 2025 - FROM 17:45 TO 19:00 UTC+09:00

  5. Joo-Yong Kim

    Joo-Yong Kim

    R&D Manager, Deposition

    Paper: AF-MoP-40 "Evaluation of a Hafnium Precursor with Higher Thermal Stability for the Atomic Layer Deposition of Hafnium Oxide Films"

    23 Jun 2025 - FROM 17:45 TO 19:00 UTC+09:00

Poster Session AF-MoP Atomic Layer Etching

  1. Kyoung-Mun Kim

    Kyoung-Mun Kim

    Senior Scientist

    Paper: ALE-MoP-4 "Atomic Layer Etching of ZrO2, HfO2 and HfZrO4 Thin Films via Metal-Free Ligand Exchange using Hydrogen Fluoride and Acetylacetone"

    23 Jun 2025 - FROM 17:45 TO 19:00 UTC+09:00

Poster Session AA-TuP ALD Applications

  1. Jared McWilliams

    Jared McWilliams

    Principal Scientist

    Paper: AA-TuP-63 "Germanium Doping for Electrical Modulation of Ferroelectric HfZrO4 Using Atomic Layer Deposition"

    24 Jun 2025 - FROM 17:45 TO 19:00 UTC+09:00

Poster Session AS-TuP Area Selective ALD

  1. Isiah Liu

    Isiah Liu

    Research Scientist

    Paper: AS-TuP-2 "Advancements in Area-Selective Deposition by Merck: From Fundamental Principles to Industrial Applications"

    24 Jun 2025 - FROM 17:45 TO 19:00 UTC+09:00

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