This event is organized by the Association for Science and Technology Materials, Interfaces and Processing (AVS).
AVS International Conference on Atomic Layer Deposition (ALD/ALE) 2025
This event is organized by the Association for Science and Technology Materials, Interfaces and Processing (AVS).
Type of Event
Other
Our Participation
Sponsor
22 Jun 2025 - 25 Jun 2025
Add to CalendarElevate your Innovations with our Vast Portfolio
Join us at the AVS ALD/ALE conference, focused on atomic layer controlled deposition of thin films and atomic layer etching. Elevate your innovations with our vast portfolio!
Connect with us
- AVS ALD Welcome Reception – Sponsored by Merck KGaA, Darmstadt, Germany
- Sunday, June 22nd from 18:00 to 20:00 @JeJu Convention Centre, Main Hall
Join us for drinks and stimulating conversations. All conference delegates are welcome to attend. Take the opportunity to get exclusive expert advice on-site.
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Advance Your Knowledge With Our Leading Engineers
-
Haripin Chandra
Senior R&D Manager
Moderator: ALD Fundamentals Session AF2-MoA Precursor Chemistry
23 Jun 2025 - FROM 13:30 TO 15:00 UTC+09:00
-
Rick Chen
Global Head of Integrated Customer Applications
Moderator: Area Selective ALD Session AS2-WeM Area Selective Deposition III
24 Jun 2025 - FROM 10:45 TO 11:45 UTC+09:00
Poster Session AF-MoP ALD Fundamentals
-
Dahyun Lee
Research Scientist
Paper: AF-MoP-3 "Characterization of Novel Precursors for Improved ALD Performance in HfO2 Films"
23 Jun 2025 - FROM 17:45 TO 19:00 UTC+09:00
-
Randall Higuchi
Scientific Associate Director
Paper: AF-MoP-8 "Novel Indium Precursor with Improved Physical Properties and ALD Window for Atomic Layer Deposition of Indium Oxide"
23 Jun 2025 - FROM 17:45 TO 19:00 UTC+09:00
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Joo-Yong Kim
R&D Manager, Deposition
Paper: AF-MoP-40 "Evaluation of a Hafnium Precursor with Higher Thermal Stability for the Atomic Layer Deposition of Hafnium Oxide Films"
23 Jun 2025 - FROM 17:45 TO 19:00 UTC+09:00
Poster Session AF-MoP Atomic Layer Etching
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Kyoung-Mun Kim
Senior Scientist
Paper: ALE-MoP-4 "Atomic Layer Etching of ZrO2, HfO2 and HfZrO4 Thin Films via Metal-Free Ligand Exchange using Hydrogen Fluoride and Acetylacetone"
23 Jun 2025 - FROM 17:45 TO 19:00 UTC+09:00
Poster Session AS-TuP Area Selective ALD
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Isiah Liu
Research Scientist
Paper: AS-TuP-2 "Advancements in Area-Selective Deposition by Merck: From Fundamental Principles to Industrial Applications"
24 Jun 2025 - FROM 17:45 TO 19:00 UTC+09:00
Investing in a Sustainable Semiconductor Future
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