01 Sep 2025
SEMICON India 2025
This event is organized by SEMI.
AVS International Conference on Atomic Layer Deposition (ALD/ALE) 2025
This event is organized by the Association for Science and Technology Materials, Interfaces and Processing (AVS).
Type of Event
Other
Our Participation
Sponsor
Elevate your Innovations with our Vast Portfolio
Join us at the AVS ALD/ALE conference, focused on atomic layer controlled deposition of thin films and atomic layer etching. Elevate your innovations with our vast portfolio!
Connect with us
- AVS ALD Welcome Reception – Sponsored by Merck KGaA, Darmstadt, Germany
- Sunday, June 22nd from 18:00 to 20:00 @JeJu Convention Centre, Main Hall
Join us for drinks and stimulating conversations. All conference delegates are welcome to attend. Take the opportunity to get exclusive expert advice on-site.
SEMICONDUCTOR SOLUTIONS information kit
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Advance Your Knowledge With Our Leading Engineers
-
Haripin Chandra
Senior R&D Manager
Moderator: ALD Fundamentals Session AF2-MoA Precursor Chemistry
23 Jun 2025 - FROM 13:30 TO 15:00 UTC+09:00
-
Rick Chen
Global Head of Integrated Customer Applications
Moderator: Area Selective ALD Session AS2-WeM Area Selective Deposition III
24 Jun 2025 - FROM 10:45 TO 11:45 UTC+09:00
Poster Session AF-MoP ALD Fundamentals
-
Dahyun Lee
Research Scientist
Paper: AF-MoP-3 "Characterization of Novel Precursors for Improved ALD Performance in HfO2 Films"
23 Jun 2025 - FROM 17:45 TO 19:00 UTC+09:00
-
Randall Higuchi
Scientific Associate Director
Paper: AF-MoP-8 "Novel Indium Precursor with Improved Physical Properties and ALD Window for Atomic Layer Deposition of Indium Oxide"
23 Jun 2025 - FROM 17:45 TO 19:00 UTC+09:00
-
Joo-Yong Kim
R&D Manager, Deposition
Paper: AF-MoP-40 "Evaluation of a Hafnium Precursor with Higher Thermal Stability for the Atomic Layer Deposition of Hafnium Oxide Films"
23 Jun 2025 - FROM 17:45 TO 19:00 UTC+09:00
Poster Session AF-MoP Atomic Layer Etching
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Kyoung-Mun Kim
Senior Scientist
Paper: ALE-MoP-4 "Atomic Layer Etching of ZrO2, HfO2 and HfZrO4 Thin Films via Metal-Free Ligand Exchange using Hydrogen Fluoride and Acetylacetone"
23 Jun 2025 - FROM 17:45 TO 19:00 UTC+09:00
Poster Session AS-TuP Area Selective ALD
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Isiah Liu
Research Scientist
Paper: AS-TuP-2 "Advancements in Area-Selective Deposition by Merck KGaA, Darmstadt, Germany: From Fundamental Principles to Industrial Applications"
23 Jun 2025 - FROM 16:45 TO 18:00 UTC+09:00
Investing in a Sustainable Semiconductor Future
Materials Matter
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