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Global

AVS International Conference on Atomic Layer Deposition (ALD/ALE) 2025

Name: AVS International Conference on Atomic Layer Deposition (ALD/ALE) 2025
Start: 2025-06-22T00:01:00.000+09:00
End: 2025-06-25T23:59:00.000+09:00

This event is organized by the Association for Science and Technology Materials, Interfaces and Processing (AVS).

Type of Event

Other

Our Participation

Sponsor

22 Jun 2025 - 25 Jun 2025

Event Website

JeJu Convention Centre, Main Hall

Jeju, South Korea

Elevate your Innovations with our Vast Portfolio

Join us at the AVS ALD/ALE conference, focused on atomic layer controlled deposition of thin films and atomic layer etching. Elevate your innovations with our vast portfolio!

Connect with us

AVS ALD Welcome Reception – Sponsored by Merck KGaA, Darmstadt, Germany
Sunday, June 22nd from 18:00 to 20:00 @JeJu Convention Centre, Main Hall

Join us for drinks and stimulating conversations. All conference delegates are welcome to attend. Take the opportunity to get exclusive expert advice on-site.

Click here to connect at the event!

SEMICONDUCTOR SOLUTIONS information kit

Download your kit to unlock exclusive content on our sustainability transformation & how our Materials Intelligence™ enables innovation for more sustainable solutions across the semiconductor value chain.

Download your kit to unlock exclusive content on our PFAS-free materials solutions &amp;amp;amp;amp;amp;amp;amp;amp;amp;amp;amp; sustainable transformation! Access to our latest webinars on integrated materials solutions and data-driven processes.&amp;amp;amp;amp;amp;amp;amp;amp;amp;amp;amp;amp;nbsp;

If you do not see the form, please click here.

Advance Your Knowledge With Our Leading Engineers

Haripin Chandra

Senior R&D Manager
Moderator: ALD Fundamentals Session AF2-MoA Precursor Chemistry

23 Jun 2025 - FROM 13:30 TO 15:00 UTC+09:00
Rick Chen

Global Head of Integrated Customer Applications
Moderator: Area Selective ALD Session AS2-WeM Area Selective Deposition III

24 Jun 2025 - FROM 10:45 TO 11:45 UTC+09:00

Poster Session AF-MoP ALD Fundamentals

Dahyun Lee

Research Scientist
Paper: AF-MoP-3 "Characterization of Novel Precursors for Improved ALD Performance in HfO2 Films"

23 Jun 2025 - FROM 17:45 TO 19:00 UTC+09:00
Randall Higuchi

Scientific Associate Director
Paper: AF-MoP-8 "Novel Indium Precursor with Improved Physical Properties and ALD Window for Atomic Layer Deposition of Indium Oxide"

23 Jun 2025 - FROM 17:45 TO 19:00 UTC+09:00
Joo-Yong Kim

R&D Manager, Deposition
Paper: AF-MoP-40 "Evaluation of a Hafnium Precursor with Higher Thermal Stability for the Atomic Layer Deposition of Hafnium Oxide Films"

23 Jun 2025 - FROM 17:45 TO 19:00 UTC+09:00

Poster Session AF-MoP Atomic Layer Etching

Kyoung-Mun Kim

Senior Scientist
Paper: ALE-MoP-4 "Atomic Layer Etching of ZrO2, HfO2 and HfZrO4 Thin Films via Metal-Free Ligand Exchange using Hydrogen Fluoride and Acetylacetone"

23 Jun 2025 - FROM 17:45 TO 19:00 UTC+09:00

Poster Session AS-TuP Area Selective ALD

Isiah Liu

Research Scientist
Paper: AS-TuP-2 "Advancements in Area-Selective Deposition by Merck KGaA, Darmstadt, Germany: From Fundamental Principles to Industrial Applications"

23 Jun 2025 - FROM 16:45 TO 18:00 UTC+09:00

Merck KGaA, Darmstadt, Germany semiconductor materials sustainability white paper

Investing in a Sustainable Semiconductor Future

Materials Matter

Semiconductor companies large and small talk about achieving climate neutrality by 2030. That sounds like a great goal. But merely achieving that goal won’t solve the emissions problem. How we get there matters.

Learn more

Webinar Series

Watch our free on-demand webinar to discover how how digital solutions are forming new ways of operating in a fast-paced, highly demanding semiconductor industry. Click here and find our webinars!