SEMICON Japan & SEMI Strategic Materials Conference (SMC) 2025

EUV-CAR lithography is widely used for the high-volume manufacturing (HVM) of advanced semiconductor devices. Water-based rinse treatment following TMAH development is an essential process for achieving yield improvement. In this study, the role of rinse materials and the required performance in EUV-CAR, and performance evaluation methods will be presented.

GHG emissions and PFAS alternatives are pivotal areas for sustainability efforts in chip manufacturing. In this presentation, Dr. Surésh Rajaraman, EVP and Head of Thin Films Business and interim Head of Formulations and Commercial Leadership Board, will highlight our advancements in identifying alternatives to help solving GHG and PFAS related challenges of the semiconductor industry.

We will provide updates on our efforts to identify suitable candidates for PFAS replacement in various applications, such as fluorinated surfactants, EUV anti-collapse rinses, PAGs for chemically amplified photoresists across different wavelengths, and top anti-reflective coatings. And we will share insights into the development of alternative etch gases with significantly reduced atmospheric lifetime, which have the potential to replace traditional etch gases and help reducing GHG emissions in chip manufacturing. Additionally, we will discuss our investment in the Advanced Materials Development Centre in Shizuoka, Japan, where it will explore alternative materials and technological solutions that support more sustainable manufacturing practices.

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