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Disclaimer
Publication of Merck KGaA, Darmstadt, Germany.
In the United States and Canada the subsidiaries of
Merck KGaA, Darmstadt, Germany operate under the umbrella brand EMD.
Focused on providing selective wet etchants for Logic and Memory.
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FEOL Selective Si Etch
Dummy gate Poly Si Removal
Technical challenges – No poly remain defect, and Epi pits free, low etch rate on oxide and SiN (<1 A/min), and less SiP film loss.
3D-NAND Selective SiNx Removal
Technical challenges – To selectively remove SiNx from the stack w/o damaging SiOx; high selective SiNx etch chemical is necessary. No Q-tip and oxide regrowth issue.
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