Fab & Facility

Intermolecular^®’s 146,000 square foot facility contains 6,800 square feet of class 100 clean room space, 4,900 square feet of class 1000, and 16,600 square feet of lab space. Our infrastructure includes two each 16000 cfm wet scrubbed corrosive exhaust with dual fans. Critical health and safety equipment is maintained with a backup 350kw generator. The facility pad supports inert (argon) as well as flammable and toxic gases (hydrogen, Silane, etc.). Nitrogen supply comes from the pipeline. All gases are monitored for cleanliness and have regularly maintained filters and purifiers. The facility also includes two 510 ton chillers, clean dry air (CDA), deionized water (DIW) as well as 400 gallons per minute process cooling water (PCW).

Intermolecular^® has the proven ability to process a wide variety of periodic table elements (Ge, Cu, As, Te, Sn, S, Cd, Zn, etc.) with controls on cross contamination. The certified class 100 clean room is constantly monitored. All process tools are tracked using Statistical Process Control (SPC) for particles as well as contamination. Contamination levels on critical process tools are maintained below top tier customer semiconductor specifications limits. We have semiconductor industry standard backside cleaning and particle measuring tools.

The facility runs 24 hours a day and 365 days a year. All tools and equipment are operated and maintained by highly skilled, trained, and certified employees. The clean room and labs contain over 200 processing tools, including Physical Vapor Deposition (PVD) tools, IMI patented Atomic Layer Deposition (ALD), and Wet Processing tools. Multiple PVD and ALD equipment can be combined for in-situ development.