Deposition
We primarily use Physical Vapor Deposition (PVD) and Atomic Layer Deposition (ALD) methods to perform the experiments needed to rapidly analyze materials. Multiple PVD and ALD equipment can be combined for in-situ development.
Characterization
Fullsuite of metrology tools to enable real-time feedback. Perform advanced structural, compositional, electrical and optical characterization.
Simulation
State-of-the-art modeling: Combining modeling with empirical data DFT simulations provides vital information.
Fab & Facility
146,000 square foot facility:
- 6,800 square feet of class 100 clean room
- 4,900 square feet of class 1000
- 16,600 square feet of lab space
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