AVS 26th International Conference on Atomic Layer Deposition (ALD 2026)

This event is organized by the Association for Science and Technology Materials, Interfaces and Processing (AVS).

Type of Event

Other

Our Participation

Sponsor

Overview

The AVS 26th International Conference on Atomic Layer Deposition (ALD 2026) featuring the 13th International Atomic Layer Etching Workshop (ALE 2026) will be a three-day meeting dedicated to the science and technology of atomic layer controlled deposition of thin films and atomic layer etching.  

Schedule

Connect with us

  • AVS ALD Welcome Reception – Sponsored by EMD Electronics
  • Sunday, June 28 from 18:00 to 20:00

Join us for drinks and stimulating conversations. All conference delegates are welcome to attend. Take the opportunity to get exclusive expert advice on-site.

Click here to connect at the event!

Advance Your Knowledge With Our Leading Engineers

  1. Rick Chen

    Rick Chen

    Global Head of Integrated Customer Applications

    Moderator:ALD Fundamentals: Growth and Characterization Session AF-MoA ALD Precursor Design I

    29 Jun 2026 - FROM 16:00 TO 17:15 UTC-04:00

  2. Haripin Chandra

    Haripin Chandra

    Senior R&D Manager

    Moderator: Enhancing Dielectric Properties of ALD Al-Doped HfO2 Films for Memory Applications: The Role of Homogeneous Aluminum Distribution

    30 Jun 2026 - FROM 8:00 TO 12:00 UTC-04:00

Technical Leadership Presentations

  1. Lukas Mai

    Lukas Mai

    Team Lead Early Screening

    Paper: AF-MoP-34 "Non-pyrophoric Zinc Precursor AP-MDS™ 131: Extended ALD Window and Benchmarking Against Diethylzinc"

    29 Jun 2026 - FROM 17:45 TO 19:00 UTC-04:00

  2. Jan-Lucas Wree

    Jan-Lucas Wree

    R&D Scientist

    Paper: AF-MoP-37 "Developments in low growth rate aluminum oxide ALD with AP-MDS™ 026 and AP-MDS™ 027"

    29 Jun 2026 - FROM 17:45 TO 19:00 UTC-04:00

  3. Taylor Hayes

    Taylor Hayes

     

    Paper: AF1-TuM-2 "Designing stable organosilane precursors for high quality silicon oxide"

    30 Jun 2026 - FROM 8:15 TO 8:30 UTC-04:00

  4. Nguyen Vu

    Nguyen Vu

    Senior Scientist

    Paper: AA-TuP-27 "Stable High-k Morphotropic Phase of HfZrO4 Using Uniformly Distributed Dopants"

    30 Jun 2026 - FROM 17:45 TO 19:00 UTC-04:00

  5. Son Hoang, Ph.D.

    Son Hoang, Ph.D.

    Materials Characterization Manager

    Paper: AA1-WeM-4 "Enhancing Dielectric Properties of ALD Al-Doped HfO2 Films for Memory Applications: The Role of Homogeneous Aluminum Distribution"

    01 Jul 2026

  6. Jared McWilliams

    Jared McWilliams

    Senior Process Engineer

    Paper: AA1-WeM-5 "Germanium Doping for Electrical Modulation of Ferroelectric HZO Using Atomic Layer Deposition"

    01 Jul 2026 - FROM 9:00 TO 9:15 UTC-04:00

  7. Andrew Kaye

    Andrew Kaye

    Graduate Student, Colorado School of Mines

    Paper: AF1-WeM-6 "Effect of Initial Surface Silanol Density and Aminosilane Structure on O2 Plasma-Assisted ALD of SiO2"

    01 Jul 2026 - FROM 9:15 TO 9:30 UTC-04:00

Contact us

  • Interested in working together or need support finding the right materials solution? Click here to connect at the show!
  • Curious about how it is to work with us as an employee? Chat with one of our colleagues directly using our interactive Q&A tool.
     

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