BARC

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AZ BARC provides a comprehensive solution for reflectivity control. The materials pose low-outgassing, reduce defects and etch rates based on proprietary polymer platforms.

Category:
  • BARC
Locations:
  • US
  • Korea
  • China
  • Taiwan
  • Japan
  • Europe
Industry:
  • Semiconductors
Brands:
  • AZ®

BARCs

BARCs (= Bottom Antireflective Coatings) provide a comprehensive solution for reflectivity control. The materials pose low-outgassing, reduced defective and etch rates based on proprietary polymer platforms.
 
Target Application
  • Logic and memory (i-line, KrF and ArF)
Value Proposition
  • Eliminates standing waves in Photoresist
  • Solves topography related lithography problems
  • Reflectivity control
  • Vertical profile
  • Gapfil, Planarization
BARC BARC

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BARC

Visual comparison: without BARC - with BARC
BARC BARC

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Optimal BARC FT - Simulate by software

Key parameter: n = Refractive Index; k = Imaginal Index; d = BARC FT
Lithography And PEM Material Roadmap Lithography And PEM Material Roadmap

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Lithography and PEM Materials

Industry roadmap, landscape and trends
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Summary of TARC vs. BARC

Items

TARC

BARC

Coating
  • Fine tune necessary on PR, especially on topography
  • Coating on any substrate
  • X-link bake@>180C
  • Outgassing: Only EB52C & EB18B

Install concerns

Micro bubble

Friendly

Etch

No need

Plasma etch

Stripping

No need

O2 ashing, strong acid

PR swing reduction

1/3

1/10, no notching

Standing wave

No improvement

Elimination

Resist profiles

Acidity control for CA PR round/T-top

Film density control for CA PR footing/undercut 

Side effect

Resist defect reduction

 

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