SPIE Advanced Lithography 2021
SPIE is the leading event for lithography where leaders come to solve challenges in optical and EUV lithography, patterning technologies, metrology, and process integration for semiconductor manufacturing.
Type of Event
Virtual Event
22 Feb 2021 - 26 Feb 2021
Our Contribution
Joint Presented Paper
- Session 6: Novel Resist Concepts and Track processes
Progress in Multi-Trigger Resist (Paper 11612-22)
Authors: Carmen M. Popescu, Greg O’Callaghan, Alex McClelland, Irresistible Materials (UK, Jim Roth, Tom Lada, Nano-C (US) Takanori Kudo, Ralph Dammel, Mansour Moinpour, Yi Cao (EMD Performance Materials (US), Alex P.G. Robinson, University of Birmingham (UK) - Session 7: DSA
Session Chair: Ralph R. Dammel, EMD Performance Materials (US)
2 Short Courses presented by Dr. Ralph Dammel, EMD Performance Materials (United States)
- Introduction to Microlithography: Theory, materials and Processing (SC101) [paid event]
- Practical Photoresist Processing (SC616) [paid event]
Tutorial Networking Event with Dr. Ralph Dammel, EMD Performance Materials (United States)
- Lithography’s Endgame: The Last Wavelength and Moore’s Law 2.0
- Live event: Friday, 26 Feb, 3:30 pm-4:30 PM PST