SPIE Advanced Lithography 2021

SPIE is the leading event for lithography where leaders come to solve challenges in optical and EUV lithography, patterning technologies, metrology, and process integration for semiconductor manufacturing.

Type of Event

Virtual Event

22 Feb 2021 - 26 Feb 2021

Our Contribution

Joint Presented Paper

  • Session 6: Novel Resist Concepts and Track processes
    Progress in Multi-Trigger Resist (Paper 11612-22)
    Authors: Carmen M. Popescu, Greg O’Callaghan, Alex McClelland, Irresistible Materials (UK, Jim Roth, Tom Lada, Nano-C (US) Takanori Kudo, Ralph Dammel, Mansour Moinpour, Yi Cao (EMD Performance Materials (US), Alex P.G. Robinson, University of Birmingham (UK)    
  • Session 7: DSA
    Session Chair: Ralph R. Dammel, EMD Performance Materials (US)

2 Short Courses presented by Dr. Ralph Dammel, EMD Performance Materials (United States)

Tutorial Networking Event with Dr. Ralph Dammel, EMD Performance Materials (United States)