SPIE Advanced Lithography + Patterning 2023
Meet leading researchers who are solving challenges in optical and EUV lithography, patterning technologies, metrology, and process integration for semiconductor manufacturing and adjacent applications.
Type of Event
Other
Our Participation
Sponsor
Meet us
- Plenary Session: 16:00-17:00 PST | Grand Ballroom, 220A
- Poster Reception with refreshments & networking opportunities: 17:30-19:30 PST | Convention Center Hall 2, Room 211B, and Grand Ballroom 220C
- Welcome Reception: 27 February 2023 • 18:00 PM -19:00 PST | Convention Center, Main Entrance Plaza - Join us to enjoy drinks and hors-d'oeuvres on the first night of the conference. All attendees are welcome. Please remember to wear your registration badge. Dress is casual.
Courses
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Ralph Dammel
Research Fellow
Course at Event: "Introduction to Microlithography: Theory, Materials, and Processing"
26 Feb 2023 - FROM 8:30 TO 17:30 UTC-08:00
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Ralph Dammel
Research Fellow
Course: "Practical Photoresist Processing"
02 Mar 2023 - FROM 8:30 TO 12:30 UTC-08:00
Technical Presentations
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Kun Si
Senior Research Scientist
Conference Presentation: "Negative-tone Resist for EUV Lithography"
01 Mar 2023 - FROM 13:50 TO 14:10 UTC-08:00
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Boaz Alperson
Conference Presentation: "EUV Lithography Line-space Pattern Rectification Using Block Copolymer Directed Self-assembly: A Roughness and Defectivity Study"
01 Mar 2023 - FROM 15:10 TO 15:30 UTC-08:00
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Walter Liu
Senior Research Specialist
Conference Presentation: "Positive Tone i-line Photoresist with Controlled Undercut Profile for Advanced Packaging"
01 Mar 2023 - FROM 17:30 TO 19:00 UTC-08:00
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Ashley Moore
Research Scientist
Conference Presentation: "Profile Control in Conductor Metal Wet Etch with Advanced Photoresists"
01 Mar 2023 - FROM 17:30 TO 19:00 UTC-08:00
Student Event
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Ivy Lewis & Ralph Dammel
Talent Acquisition Partner
Social and Networking Event: Mentor & Student Luncheon
27 Feb 2023 - FROM 12:30 TO 13:30 UTC-08:00
Interesting in our webinar?
Watch our on-demand webinar to discover how Directed Self-Assembly (DSA) technology and its material development can help overcome the scaling barriers of EUV lithography. By clicking this button, you're leaving our website to SEMI.
Discover Future talk
Can you imagine microchips that can assemble themselves at the molecular level?! Tune in as our experts, Dr. Baskaran Durairaj and Dr. Jerome Wandell, explore the many benefits of Directed Self-Assembly (DSA) technology. Click and listen Microchips, Inspired by Nature!
Contact us
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