SPIE Advanced Lithography + Patterning 2023

Meet leading researchers who are solving challenges in optical and EUV lithography, patterning technologies, metrology, and process integration for semiconductor manufacturing and adjacent applications.

Type of Event


Our Participation


Meet us

  • Welcome Reception: 27 February 2023 • 18:00 PM -19:00 PST | Convention Center, Main Entrance Plaza - Join us to enjoy drinks and hors-d'oeuvres on the first night of the conference. All attendees are welcome. Please remember to wear your registration badge. Dress is casual.
  • Mentor and Student Luncheon: 27 February 2023 • 12:30 PM - 1:30 PM PST | Marriott, San Jose V - Student conference attendees are invited to join us at this engaging networking lunch with top members in the field. This event gives students an opportunity to meet our mentors who will share their insights into career paths in lithography. 
  • Poster Session: 1 March 2023 • 5:30 PM - 7:00 PM PST | Convention Center, Hall 2 - Connect with our subject matter experts during the poster session on Wednesday evening. Come view the posters, enjoy light refreshments, and ask questions to the authors of poster papers who will be present to answer questions concerning their papers.
  • Career Networking Social: 1 March 2023 • 11:30 AM - 12:30 PM PST |  Convention Center, Exhibition Hall, Community Stage - Network with the panelists and join the advanced lithography community to discuss current projects, next career steps, and more. Complimentary snacks and beverages are provided.

Contact us

  • Get expert advice on-site. Click here to connect at the show!
  • Need support finding the right solution? Our team of specialists can help! Contact us if you have a tech question, if you need a quote or sample, or if you are looking for a tech document.


  1. Ralph Dammel

    Technology Fellow

    Course SC101: "Introduction to Microlithography: Theory, Materials, and Processing" and Course SC616 "Practical Photoresist Processing"

    26 Feb 2023 - FROM 8:30 TO 17:30 UTC-08:00

Technical Presentations

  1. Kun Si

    Senior Research Scientist

    Paper 12498-37: "Negative-tone Resists for EUV Lithography"

    01 Mar 2023 - FROM 13:50 TO 14:10 UTC-08:00

  2. Boaz Alperson

    Head of Patterning R&D Branchburg & DSA Program

    Paper 12497-30 (Co-Author): "EUV Lithography Line-space Pattern Rectification Using Block Copolymer Directed Self-assembly: A Roughness and Defectivity Study"

    01 Mar 2023 - FROM 15:10 TO 15:30 UTC-08:00

  3. Hiroshi Yanagita

    Senior Scientist

    Paper 12498-46: "The Novel Materials for Pattern Growing on EUV Resists"

    01 Mar 2023 - FROM 17:20 TO 17:40 UTC-08:00

  4. Walter Liu

    Senior Research Specialist

    Paper 12498-56: "Positive Tone i-line Photoresist with Controlled Undercut Profile for Advanced Packaging"

    01 Mar 2023 - FROM 17:30 TO 19:00 UTC-08:00

  5. Ashley Moore

    Research Scientist

    Paper 12498-55: "Profile Control in Conductor Metal Wet Etch with Advanced Photoresists"

    01 Mar 2023 - FROM 17:30 TO 19:00 UTC-08:00

  6. Matthias F. Koch

    Associate Director

    Paper 12498-63: "Novel Polymer Design for Ultra-low Stress Material for Advanced Packaging Applications" and Paper 12497-40: "Advancing High Resolution Photolithography with Hybrid Polymers for Waferscale Manufacture of Microoptics and Patterned Passivation Layers"

    01 Mar 2023 - FROM 17:30 TO 19:00 UTC-08:00

Interesting in our webinar?

Watch our on-demand webinar to discover how Directed Self-Assembly (DSA) technology and its material development can help overcome the scaling barriers of EUV lithography. By clicking this button, you're leaving our website to SEMI.

Discover Future talk

Can you imagine microchips that can assemble themselves at the molecular level?! Tune in as our experts, Dr. Baskaran Durairaj and Dr. Jerome Wandell, explore the many benefits of Directed Self-Assembly (DSA) technology. Click and listen Microchips, Inspired by Nature!