SPIE Advanced Lithography + Patterning 2025
Join leading researchers who are solving challenges in optical and EUV lithography, patterning technologies, metrology, and process integration for semiconductor manufacturing and adjacent applications.
Type of Event
Other
23 Feb 2025 - 27 Feb 2025
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Advancing Sustainability
Our Materials Intelligence™enables innovations for more sustainable solutions across the semiconductor value chain.
Industry Appreciation Reception
Join us for an evening filled with engaging conversations, hors d'oeuvres, premium wine, and the opportunity to network with industry peers.
Don't miss out on this special night to build valuable connections together!
Space is limited. Register below to attend.
- Tuesday, February 25 18:00-22:00 PST | Market Street Room, Convention Center Hotel Marriott San Jose
Registration
If you do not see the form, please click here.
Oral Presentations
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Ralph Dammel
Technology Fellow | Co-Author
Co-Author & Presenter: Satinder Kumar Sharma, Indian Institute of Technology Mandi, Ravi Kanjolia, Technology Fellow | Paper 13428-8 “High-performance metal organic cluster resists for high-NA extreme ultraviolet lithography”
24 Feb 2025 - FROM 14:40 TO 15:00 UTC-08:00
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Toshiya Okamura
R&D Manager
Paper 13428-26 “Development of a negative-tone EUV photoresist system”
24 Feb 2025 - FROM 15:20 TO 15:40 UTC-08:00
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Dong-Ook Kim
R&D Scientist
Paper 13427-27 “Improvement of EUV contact hole pattern rectification using novel directed self-assembly materials”
26 Feb 2025 - FROM 9:00 TO 9:20 UTC-08:00
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Ionela-Daniela Carja
R&D Scientist
Paper 13428-36 “Addressing the PFAS challenge in lithography: a holistic approach”
26 Feb 2025 - FROM 9:20 TO 9:40 UTC-08:00
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Victor Monreal
Senior R&D Scientist
Invited Paper 13427-29 “Roughness improvements with new high-chi block copolymers for EUV rectification directed self-assembly”
26 Feb 2025 - FROM 9:40 TO 10:10 UTC-08:00
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Xianfeng Gao, PhD
R&D Scientist
Paper 13427-31 “Directed self-assembly of medium-chi and high-chi block copolymers for DRAM C/H patterning”
26 Feb 2025 - FROM 11:00 TO 11:20 UTC-08:00
Poster Session Reception
February 26, 17:30-19:00 | Convention Center, Hall 2
- Presenter: Hung-Yang Chen | R&D Scientist Paper 13428-72 “Fluorine-free i-line thick film photoresist for advanced semiconductor packaging”
SPIE Activities
- Introduction to Microlithography: Theory, Materials, and Processing February 23, 8:30 to 17:30 PST | Instructor(s): Ralph R. Dammel; Murrae J. Bowden, EMP Consultants
- Practical Photoresist Processing February 27, 8:30 to 12:30 PST | Instructor(s): Ralph R. Dammel
SPIE Student-Mentor Luncheon February 24, 12:00-13:30 PST | Convention Center, Room 212B
- Network with the panelists and join the advanced lithography community to discuss current projects, next career steps, and more.
SPIE Welcome Reception February 24, 18:00-19:00 PST | Convention Center, Grand Ballroom Foyer
- Join us to enjoy drinks and hors-d'oeuvres on the first night of the conference. All attendees are welcome. Please remember to wear your registration badge. Dress is casual.
SPIE Career Networking Lunch February 26 from 12:00 To 13:00 PST | Convention Center, Room 212B
- Join a panel discussion and explore potential career pathways in the world of advanced lithography and patterning.
Contact us
- Interested in working together or need support finding the right materials solution? Click here to connect at the show!
- Curious about how it is to work with us as an employee? Chat with one of our colleagues directly using our interactive Q&A tool.
Materials Matter
Semiconductor companies large and small talk about achieving climate neutrality by 2030. That sounds like a great goal. But merely achieving that goal won’t solve the emissions problem. How we get there matters.
Interesting in our webinar?
Watch our on-demand webinar to discover how Directed Self-Assembly (DSA) technology and its material development can help overcome the scaling barriers of EUV lithography. By clicking this button, you're leaving our website to SEMI.