ArF Rinse

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Industry standard brought through our collaboration with TEL. Improvements have been observed in resist pattern collapse, process window, and resolution by replacing DI water with ArF rinse.

Category:
  • ArF Rinse
Locations:
  • US
  • Korea
  • China
  • Taiwan
  • Japan
  • Europe
Industry:
  • Semiconductors
Brands:
  • AZ®

Chemical Rinse

Rinse chemical is another industry standard brought through our collaboration with TEL. By replacing deionized water with rinse chemical, resist pattern collapse could be significantly improved. The process helps customers expand process window and enable higher resolution. Some additional benefits include defective reduction and potentially LER/LWR improvement.
 
Target Application
  • Logic and memory (KrF, ArF-d, ArF-I, EUV)
Value Proposition
  • Pattern collapsing elimination
  • Defect reduction
  • LWR improvement

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Chemical Shrink And Rinse
Rinse chemicals
Rinse chemicals mitigate pattern collapse at high aspect ratio and higher resolution

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