ArF Rinse


Industry standard brought through our collaboration with TEL. Improvements have been observed in resist pattern collapse, process window, and resolution by replacing DI water with ArF rinse.

  • ArF Rinse
  • Global
  • US
  • Korea
  • China
  • Taiwan
  • Japan
  • Europe
  • Semiconductors
  • AZ®

Chemical Rinse

Rinse chemical is another industry standard brought through our collaboration with TEL. By replacing deionized water with rinse chemical, resist pattern collapse could be significantly improved. The process helps customers expand process window and enable higher resolution. Some additional benefits include defective reduction and potentially LER/LWR improvement.
Target Application
  • Logic and memory (KrF, ArF-d, ArF-I, EUV)
Value Proposition
  • Pattern collapsing elimination
  • Defect reduction
  • LWR improvement

By {{ authorText(item) }}

{{ item.publicationDate }}

Find the right material

Identifying the right product can be overwhelming. Our experts can help you find the most suitable solution for your needs.