DYNASTRIP® DL9150B TMAH-Free Multipurpose Photoresist and Post-Etch Residue Remover

DYNASTRIP^® DL9150B Tetramethylammonium Hydroxide (TMAH)-Free Multipurpose Photoresist and Post-Etch Residue Remover is a formulated solution designed specifically for the removal of processed photoresists and post-silicon etch residues. It is effective in removing positive or negative (liquid or dry) photoresist or organometallic residues from silicon etch processes (Bosch process).