TaCl5

Print

TaCl5 is a solid ALD precursor for deposition of Tantalum Nitride films.

Category:
  • Metal Nitrides
Locations:
  • US
  • Korea
  • China
  • Taiwan
  • Japan
  • Europe
Industry:
  • Semiconductors
  • Logic
  • Memory (DRAM, NAND, 3D NAND)

By {{ authorText(item) }}

{{ item.publicationDate }}

Find the right material

Identifying the right product can be overwhelming. Our experts can help you find the most suitable solution for your needs.

Contact us