The 23rd International Conference on Atomic Layer (ALD/ALE) 2023

Join us to discuss the latest technology of atomic layer-controlled deposition of thin films and now topics related to atomic layer etching.

Type of Event

Other

Our Participation

Sponsor

23 Jul 2023 - 26 Jul 2023

Hyatt Regency Bellevue in Bellevue, Washington

Intro

Organized by the Association for Science and Technology of Materials, Interfaces & Processing (AVS), the conference is dedicated to the science and technology of atomic layer controlled deposition of thin films and now topics related to atomic layer etching. Since 2001, the ALD conference has been held alternately in the United States, Europe, and Asia, allowing fruitful exchange of ideas, know-how, and practices between scientists.

Meet us

  • Need support finding the right materials solution?  Get expert advice on-site. Click here to connect at the event!
  • Contact us if you have a tech question, if you need a quote or sample, or if you are looking for a tech document.

Advance Your Knowledge With Our Leading Engineers

  1. Thong Ngo

    R&D Scientist

    Paper NS-MoA-15 "300 mm Wafer-Scale and Self-limiting Layer Synthesis of 2D MoSe2 by Atomic Layer Deposition"

    24 Jul 2023 - FROM 17:00 TO 17:15 UTC-07:00

  2. Randall Higuchi

    Process Engineer

    Paper AF-MoP-38 Co-Authors: Ruben Waldman, Pezhman Arab, Charlene Chen, and Daniel Lee "Evaluation of a Zr Precursor and Hf Precursor with Higher Thermal Stability for the Atomic Layer Deposition of ZrO2 and HfO2 Films"

    24 Jul 2023 - FROM 17:45 TO 19:00 UTC-07:00

  3. Haripin Chandra

    Sr. R&D Manager

    Paper AF-MoP-42 Co-Authors: Changwon Lee "Properties of VHF PEALD Silicon Nitride Film Deposited by Precursors with Different Amino Ligands"

    24 Jul 2023 - FROM 17:45 TO 19:00 UTC-07:00

  4. Ravi Kanjolia

    Technology Fellow

    Paper AM-MoP-3 Co-Authors: Mansour Moinpour and Jacob Woodruff "Reverse Templating Effects of Low-Resistivity Ru Ald on Sputtered Ru"

    25 Jul 2023 - FROM 17:45 TO 19:00 UTC-07:00

  5. Ravi Kanjolia

    Technology Fellow

    Paper AF2-TuM-16 Co-Authors: Mansour Moinpour "Crystalline Gallium Nitride Deposition on SiO2/Si by RF-Biased Atomic Layer Annealing"

    26 Jul 2023 - FROM 11:45 TO 12:00 UTC-07:00

  6. Martin McBriarty

    Materials Scientist

    Paper ALE1-WeM-8 "Thermal ALE Reactants for Semiconductor Processing"

    26 Jul 2023 - FROM 9:45 TO 10:00 UTC-07:00

  7. Haripin Chandra

    Sr. R&D Manager

    Moderator of EM-WeM "Emerging Materials Session: EUV Litho Materials"

    26 Jul 2023 - FROM 10:45 TO 12:00 UTC-07:00

Webinar Series

Watch our free on-demand webinar to discover how how digital solutions are forming new ways of operating in a fast-paced, highly demanding semiconductor industry. Click here and find our webinars!

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