The 23rd International Conference on Atomic Layer (ALD/ALE) 2023

Name: The 23rd International Conference on Atomic Layer (ALD/ALE) 2023
Start: 2023-07-23T00:01:00.000+02:00
End: 2023-07-26T23:59:00.000+02:00

Join us to discuss the latest technology of atomic layer-controlled deposition of thin films and now topics related to atomic layer etching.

Type of Event

Other

Our Participation

Sponsor

23 Jul 2023 - 26 Jul 2023

Hyatt Regency Bellevue in Bellevue, Washington

Event Website

Intro

Organized by the Association for Science and Technology of Materials, Interfaces & Processing (AVS), the conference is dedicated to the science and technology of atomic layer controlled deposition of thin films and now topics related to atomic layer etching. Since 2001, the ALD conference has been held alternately in the United States, Europe, and Asia, allowing fruitful exchange of ideas, know-how, and practices between scientists.

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Check our schedule

Advance Your Knowledge With Our Leading Engineers

Thong Ngo

R&D Scientist
Paper NS-MoA-15 "300 mm Wafer-Scale and Self-limiting Layer Synthesis of 2D MoSe2 by Atomic Layer Deposition"

24 Jul 2023 - FROM 17:00 TO 17:15 UTC-07:00
Randall Higuchi

Process Engineer
Paper AF-MoP-38 Co-Authors: Ruben Waldman, Pezhman Arab, Charlene Chen, and Daniel Lee "Evaluation of a Zr Precursor and Hf Precursor with Higher Thermal Stability for the Atomic Layer Deposition of ZrO2 and HfO2 Films"

24 Jul 2023 - FROM 17:45 TO 19:00 UTC-07:00
Haripin Chandra

Sr. R&D Manager
Paper AF-MoP-42 Co-Authors: Changwon Lee "Properties of VHF PEALD Silicon Nitride Film Deposited by Precursors with Different Amino Ligands"

24 Jul 2023 - FROM 17:45 TO 19:00 UTC-07:00
Ravi Kanjolia

Technology Fellow
Paper AM-MoP-3 Co-Authors: Mansour Moinpour and Jacob Woodruff "Reverse Templating Effects of Low-Resistivity Ru Ald on Sputtered Ru"

25 Jul 2023 - FROM 17:45 TO 19:00 UTC-07:00
Ravi Kanjolia

Technology Fellow
Paper AF2-TuM-16 Co-Authors: Mansour Moinpour "Crystalline Gallium Nitride Deposition on SiO2/Si by RF-Biased Atomic Layer Annealing"

26 Jul 2023 - FROM 11:45 TO 12:00 UTC-07:00
Martin McBriarty

Materials Scientist
Paper ALE1-WeM-8 "Thermal ALE Reactants for Semiconductor Processing"

26 Jul 2023 - FROM 9:45 TO 10:00 UTC-07:00
Haripin Chandra

Sr. R&D Manager
Moderator of EM-WeM "Emerging Materials Session: EUV Litho Materials"

26 Jul 2023 - FROM 10:45 TO 12:00 UTC-07:00

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