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Publication of Merck KGaA, Darmstadt, Germany.
In the United States and Canada the subsidiaries of
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ADVANCED PHOTORESISTS FOR THE MORE-THAN-MOORE INDUSTRY
The megatrends of mobile applications and smart cars are enabled by leading manufacturers of devices such as RF components, MEMS, Power ICs - just to mention a few. Improvements in performance and integration requirements urge advancements in technology, in chip design, and manufacturing processes. Thereby, lithography plays a key role and new, process specific needs emerge that call for new solutions. This talk will provide insights into our recent developments in photoresist which are specifically designed to meet the needs of the More-than-Moore industry.
We provide a broad material portfolio enabling advanced photolithography. Rinse material is a unique offering to alleviate capillary force hence mitigate pattern collapse in very fine photoresist pattern through reducing surface tension with novel surfactants. Based on the knowledge and know-hows acquired in the development of rinse materials for ArF dry/immersion lithography processes in the past decades, new material platforms have been developed to extend the technique to meet the ever critical requirements in the era of EUV lithography. We are committed to providing novel solutions to confront the increasing technical challenges in advanced patterning.
