Photosensitive Patterning Materials
Core Resists for photo-lithography processes
Performance Materials Core Resists offers BB\X-over, g-line/i-line photoresist for submicron lithography processes, and KrF/ArF photoresists for nanometer lithography processes. These photoresists are used in semiconductor device manufacturing, for terminal devices such as smartphones and tablets as well as applications in IoT and autonomous driving technology. We are a leading solutions supplier with extensive experience and proven lower total cost of ownership.
We do this with our customer’s health and safety in mind as we produce our sustainable materials in an environmental friendly manner.